ISO 21859:2019
ISO 21859:2019

ISO 21859:2019

June 2019
International standard Current

Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

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Main informations

Collections

International ISO standards

Publication date

June 2019

Number of pages

4 p.

Reference

ISO 21859:2019

ICS Codes

81.060.30   Advanced ceramics

Print number

1
Sumary
Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

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