XP ISO/TS 13278

XP ISO/TS 13278

February 2018
Standard Current

Nanotechnologies - Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry

ISO/TS 13278:2017 provides methods for the determination of residual elements other than carbon in samples of single-wall carbon nanotubes (SWCNTs) and multiwall carbon nanotubes (MWCNTs) using inductively coupled plasma mass spectrometry (ICP-MS).The purpose of this document is to provide optimized digestion and preparation procedures for SWCNT and MWCNT samples in order to enable accurate and quantitative determinations of elemental impurities using ICP-MS.

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Main informations

Collections

National standards and national normative documents

Publication date

February 2018

Number of pages

26 p.

Reference

XP ISO/TS 13278

ICS Codes

07.120   Nanotechnologies

Classification index

T16-207

Print number

1

International kinship

ISO/TS 13278:2017
Sumary
Nanotechnologies - Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry

ISO/TS 13278:2017 provides methods for the determination of residual elements other than carbon in samples of single-wall carbon nanotubes (SWCNTs) and multiwall carbon nanotubes (MWCNTs) using inductively coupled plasma mass spectrometry (ICP-MS).

The purpose of this document is to provide optimized digestion and preparation procedures for SWCNT and MWCNT samples in order to enable accurate and quantitative determinations of elemental impurities using ICP-MS.

Replaced standards (1)
FD T16-207
February 2012
Published document Cancelled
Nanotechnologies - Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry

Le présent document fournit des méthodes pour la détermination des éléments résiduels autres que le carbone dans les échantillons de nanotubes de carbone à paroi simple (SWCNT) et de nanotubes de carbone à parois multiples (MWCNT) par spectrométrie de masse à plasma induit (ICP-MS). Le but de ce document est de fournir des procédures optimisées de digestion et de préparation d'échantillons SWCNT et MWCNT pour permettre un dosage exact et quantitatif des impuretés élémentaires par analyse ICP-MS.

Table of contents
  • 1 Domaine d'application
  • 2 Références normatives
  • 3 Termes et définitions, symboles et abréviations
  • 4 Échantillons et réactifs
  • 5 Appareillage
  • 6 Prétraitement de l'échantillon
  • 7 Modes opératoires expérimentaux
  • 8 Analyse des données et interprétation des résultats
  • 9 Estimation de l'incertitude
  • 10 Rapport d'essai
  • Annexe A Exemple de détermination des impuretés élémentaires dans des nanotubes de carbone
  • Bibliographie
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